TZ since the dry-type light-sensitive anti-etching ink manual 
 Process Description: Metal Etching is the first in the metal substrate with screen printing or spray obscured the need to protect the site on the metal substrate and then etch away the unwanted parts of chemical corrosion; better to improve the accuracy of etching products, adapt to the needs of mass production, the Division of Engineering Technology in 2098, developed a light-sensitive anti-etching ink, the ink photosensitive imaging and etch resistance properties succeeded in solving this problem, including this ink is widely used in watches and clocks, jewelry, cell phone case do to protect the decorative boards, industry templates, electronic components, filters, and metal button metal etching process. 
 Features: For spraying or screen printing production, uniform coating surface, no bubbles or pinholes, fast drying, high imaging fine, with excellent adhesion, excellent anti-etch performance. 
 Process: the substrate surface cleaning - spraying or screen printing ink - dry - Exposure - developing - Etching - Stripping. 
 Technical characteristics: 
 The general standard of the project 
 Viscosity 120-150 (25 ° C, dpa.s) 
 Fineness of ≤ 5-10micro; m 
 Curing conditions of thickness 10-20micro; m ,800-1200mj / cm2 
 Film hardness (Mitsubishi Pencil, 1kg force) ≥ 3H 
 Adhesion (3M in high-viscosity adhesive tape) 100/100 grid method 
 Ingredients one-component 
 Ink operating parameters: 
 A. Pre-treatment: product surface degreasing, wax, etc. cleaning. 
 Two. Open oil: production can be added to the diluent to adjust viscosity (1:0.7 ratio of spray can be add diluent) Stir for 3-5 minutes, and placed for 1-2 minutes, the maximum amount of not more than 1 times; (available days water diluent) 
 3. Coating: ink diluted spray viscosity of 18-25 seconds / Tu four cups; screen printing can be used 77T-100T screen printing; can also roll coating or dip coated on both sides; 
 4. Drying: natural dryness 
 5 Exposure: cooling exposure machine 6-8 grid (21 grid exposure of the feet); 
 6. Imaging: 0.8% -1% of Na2CO3 solution flushing, pressure of about 2KG / cm2, temperature 30 ° C ± 2; 
 Etching: corrosion in the etching machine using acidic etching solution; 
 8. To the film: the film you can go about 1-3 minutes with 10% NaOH solution to the membrane tank. 
 Changzhou State Electronic Materials Technology Co., Ltd. e-mail: xiaomende123@163.com 
 Address: Changzhou Wujin District, Xueyan Tel: 15151950647